sputtering target MoS2 99.9% for Ion Beam Sputtering

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price: Negotiable
minimum:
Total supply:
Delivery term: The date of payment from buyers deliver within days
seat: Beijing
Validity to: Long-term effective
Last update: 2017-11-30 01:51
Browse the number: 108
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Product details
MoS2 target 99.9%

Physical properties

Color Black

Density 4.80g/ml

Melting point 1185

Technical indicators
purity 99.9%

Relative density >99%

Cut surface flatness 3.2Ra

Tolerance ±0.1mm

grain size uniform

Material MoS2

Brand MAT-CN

Origin Nanchang Jiangxi

Specifications

Size 01: diameter <360mm

thickness> 1 mm

(wafer / round table / rod)

Size 02: length <300mm

width <300mm

thickness> 1mm

(rectangular / sheet /splicing)

Size 03: outer diameter <360mm

inner diameter> 1mm

length> 1 mm

(pipe / ring / rotatable targets)

Size 04: be customized according to user needs, sample processing, to map processing

Minimum order quantity 1 piece, large concessions

Supply capacity the same batch, the same material, continuous and reliable supply; 100 kg / month min

Delivery time 3 weeks after payment,excluding special materials

Production process vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments various models magnetron sputtering equipment, etc.

Product accessories

formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice

Mode of transport for

domestic express carrier (SF, Shen Tong, EMS, Nadu --- safe, fast and reliable)
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